When: 2010-09-12 to 2010-09-17
Country/City: U.S.A., Monterey
Venue: Monterey Conference Center
Related Industries: Industrial Goods trade show
Description:
In a weakly recovering economy it is more important than ever that you reach as many of your customers as possible. As the most recognized international meeting for presenting innovations in the mask-making industry, SPIE Photomask Technology is the event for the people, institutions, and companies driving this critical and influential business.
For Visitor:
Engineers and designers, Corporate managers from the mask making industry, Application and product developers, Mask and chip designers, Resist chemists, Quality assurance specialists, Experts in mask infrastructure and mask integration, People working in emerging mask technologies are the target attendees.
Exhibit profile:
Profile for exhibit includes Frames & Mountings, Parts & Accessories, Related Chemical & Materials, Optometric Instruments, Spectacle Cases & Holders, Related Machinery & Equipment, Related Packaging Materials, Retail & Shop Design, Equipment & Technology, Trade Services etc.
