When: 2011-04-13 to 2011-04-15
Country/City: Japan, Yokohama
Venue: Yokohama Pacifico Convention Plaza
Related Industries: Industrial Goods trade show
Description:
Photomask Japan is the premiere event for presenting innovations related to mask-making technologies. Photomask Japan Technologies continues to attract the people, institutions, and companies that drive this critical and influential industry. Being organized by SPIE-International Society for Optical Engineering, it is 3 days fair which will unwrap emerging technologies worldwide.
For Visitor:
Trade attendees - Manufacturers, Importers & exporters of glasses, sunglasses, lenses & other related products & General Public are the target attendees.
Exhibit profile:
Photomasks, Equipments for Photomasks, process and equipments for developing, etching, cleaning etc., Photomask Writing Tools and Technologies, Metrology Tools and Technologies, Inspection Tools and Technologies, Repairing Tools and Technologies, Mask Data Preparations, EDA and DFM for Photomasks, Photomasks with RET: PSM, Masks with OPC, Photomask-relating Lithography Technologies, NGL Masks and Applications, EUV, Nano-imprint etc.
